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Conference Proceedings

1. Photoresist adhesion effect of resist reflow process

J. Park ; J. Lee ; M. Kim ; J. Kim ; S. Lee ; J. Park ; C. Bok ; S. Moon ; S. Park ; J. Hong ; H. Oh

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

2. Hyper NA polarized imaging of 45nm DRAM

C. Lim ; S. Park ; Y. Hyun ; J. Kim ; T. Eom ; J. Park ; S. Moon

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

3. Application of nanoimprint lithography to nano-optics: wire grid polarizer and photonic crystal LED

K. Lee ; S. Kim ; J. Park ; J. Kim ; S. Park

Pub. info.:	Micromachining technology for micro-optics and nano-optics V and microfabrication process technology XII : 22-24 January 2007, San Jose, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6462