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Conference Proceedings
Conference Proceedings
1. Fabrication and Characterization of Organic Light-Emitting Diodes using Transparent Single-Crystal-Silicon Membrane
S. Lee ; D. Kim ; H. Yang ; G. Lee ; J. Park
Pub. info.: Nanotechnology (General) - 213th ECS Meeting.  pp.13-17,  2008.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 13(18)
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Conference Proceedings
Conference Proceedings
2. Removal of Organic Wax and Particles on Silicon after Batch type Polishing by Ozonated DI Water
J. Yi ; S. Lee ; T. Kim ; J. Park ; G. Lee
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.79-84,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
3.

Conference Proceedings
Conference Proceedings
3. Fabrication and Characterization of Semiconducting ZnO nanofiber for Advanced Environmental Sensing
T. Zyung ; S. Lee ; J. Park ; J. Moon
Pub. info.: ZnO based thin films, nano-wires, and nano-belts for photonic and electronic devices and sensors.  pp.87-93,  2008.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 16(12)
4.

Conference Proceedings
Conference Proceedings
4. Operating Characteristics of Advanced 500W Class Anode-supported Flat Tubular SOFC stack in KIER
T. Lim ; G. Kim ; J. Park ; R. Song ; S. Lee ; D. Shin
Pub. info.: Solid oxide fuel cells 10 (SOFC-X).  pp.193-198,  2007.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 7(1)
5.

Conference Proceedings
Conference Proceedings
5. Photoresist adhesion effect of resist reflow process
J. Park ; J. Lee ; M. Kim ; J. Kim ; S. Lee ; J. Park ; C. Bok ; S. Moon ; S. Park ; J. Hong ; H. Oh
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
6.

Conference Proceedings
Conference Proceedings
6. OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect
Y. Kim ; I. Kim ; J. Park ; S. Kim ; S. Suh ; Y. Cheon ; S. Lee ; J. Lee ; C. Kang ; J. Moon ; J. Cobb ; S. Lee
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
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Conference Proceedings
Conference Proceedings
7. New PEC optimization for the mask fabrication of sub-50nm memory device
S. Lee ; D. Ryu ; J. Park ; D. Nam ; H. Kim ; B. Kim ; S. Woo ; H. Cho
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
8.

Conference Proceedings
Conference Proceedings
8. Novel 1x3 wavelength MUX/DeMUX using extraneous self-imaging phenomenon
J. Hong ; J. Jung ; J. Park ; S. Lee
Pub. info.: Optoelectronic integrated circuits IX : 22-24 January 2007, San Jose, California.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6476
9.

Conference Proceedings
Conference Proceedings
9. Leakage characteristics for the buried photodiode structure on vertical CMOS image sensors
S. Lee ; S. Lim ; C. Lee ; J. Park ; S. Bang ; S. Kang ; R. A. Martin ; S. Bae ; J. W. Park
Pub. info.: Digital photography III : 29-30 January 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6502
10.

Conference Proceedings
Conference Proceedings
10. Properties of EUVL masks as a function of capping layer and absorber stack structures
H. Seo ; J. Park ; S. Lee ; H. Kim ; S. Kim ; H. Cho
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517