1.

Conference Proceedings
Conference Proceedings
1. New PEC optimization for the mask fabrication of sub-50nm memory device
S. Lee ; D. Ryu ; J. Park ; D. Nam ; H. Kim ; B. Kim ; S. Woo ; H. Cho
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
2.

Conference Proceedings
Conference Proceedings
2. Properties of EUVL masks as a function of capping layer and absorber stack structures
H. Seo ; J. Park ; S. Lee ; H. Kim ; S. Kim ; H. Cho
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517