1.

Conference Proceedings
Conference Proceedings
1. Effective Workfunction Modulation by As Implantation in Metal Gate Stacks
R. Singanamalla ; H. Yu ; T. Janssens ; T. Witters ; T. Schram ; S. Kubicek ; S. DeGendt ; M. Jurczak ; K. De Meyer
Pub. info.: Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing.  pp.49-62,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 2(1)
2.

Conference Proceedings
Conference Proceedings
2. Ni, Pt and Yb Based Fully Silicided (FUSI) Gates for Scaled CMOS Technologies
J. A. Kitti ; A. Lauwers ; M. van Dal ; H. Yu ; A. Veloso ; T. Hoffinann ; M. Pawlak ; C. Demeurisse ; S. Kubicek ; M. Niwa ; C. Vrancken ; P. Absil ; S. Bieseinans
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment.  pp.233-246,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(2)