1.

Conference Proceedings
Conference Proceedings
1. Extremely High-Density Capacitors with ALD High-k Dielectric Layers
Klootwijk, J. ; Kemmeren, A. ; Wolters, R. ; Roozeboom, F. ; Verhoeven, J. ; Van Den Heuvel, E.
Pub. info.: Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices.  pp.17-29,  2006.  Dordrecht.  Springer
Title of ser.: NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.: 220
2.

Conference Proceedings
Conference Proceedings
2. Laser Annealing for Ultra-Shallow Junction Formation in Advanced CMOS
Surdeanu, R. ; Ponomarev, Y.V. ; Cerutti, R. ; Pawlak, B.J. ; Nanver, L.K. ; Hoflijk, I. ; Stolk, P.A. ; Dachs, C.J.J. ; Verheijen, M.A. ; Kaiser, M. ; Hopstaken, M.J.P. ; van Berkum, J.G.M. ; Roozeboom, F. ; Lindsay, R.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.413-428,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11
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Conference Proceedings
Conference Proceedings
3. Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon
Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; Stalk, P.A. ; Huizing, H.G.A. ; van Berkum, J.G.M ; Toan, N.N. ; Woerlee, P.H. ; Cristiano, F. ; Claverie, A.
Pub. info.: Advances in rapid thermal processing : proceedings of the symposium.  pp.125-132,  1999.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-10
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Conference Proceedings
Conference Proceedings
4. High-Density, Low-Loss MOS Capacitors for Integrated RF Decoupling
Roozeboom, F. ; Elfrink, R.J.G. ; Rijks, G.S.M., Th ; Verhoeven, J.F.C.M. ; Kemmeren, A. ; van den Meerakker, J.E.A.M.
Pub. info.: Proceedings : International Symposium on Advanced Packaging Materials : processes, properties and interfaces, Chateau Elan, Braselton, Georgia, March 11-14, 2001.  pp.477-483,  2001.  Washington, DC.  IMAPS
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4587
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Conference Proceedings
Conference Proceedings
5. 26 Tantalum-based Gate Electrode Metals for Advanced CMOS Devices
Hooker, J. C. ; Lander, R.J.P. ; Cubaynes, F. N. ; Schram, T. ; Roozeboom, F. ; van Zijl, J. ; Moos, M. ; van den Heuvel, F.C. ; Naburgh, E. ; van Berkum, J. G. M. ; Tamminga, Y. ; Dao, T. ; Henson, K. ; Schaekers, M. ; van Ammel, A. ; Tokei, Z. ; Demand, M. ; Dachs, C. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.215-224,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
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Conference Proceedings
Conference Proceedings
6. Role of Silicon and Boron Interstitial Clusters in Transient Enhanced Diffusion
Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; van Berkum, J.G.M ; Colombeau, B. ; Claverie, A.
Pub. info.: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.61-72,  2000.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-9
7.

Conference Proceedings
Conference Proceedings
7. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.747-760,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
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Conference Proceedings
Conference Proceedings
8. Concept of Electrically Switchable Reflector Films on the Camber Walls of RTP Reactors
Roozeboom, F. ; van der Sluis, P. ; Cowern, N.E.B.
Pub. info.: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.41-48,  2001.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-9
9.

Conference Proceedings
Conference Proceedings
9. Ostwald Ripening of {113} Defects Precursors and Transient Enhanced Diffusion
Mannino, G. ; Cowern, N. E. B. ; Stolk, P. A. ; Roozeboom, F. ; Huizing, H. G. A. ; Berkum, J. G. M. van ; Boer, W. B. de ; Cristiano, F. ; Claverie, A. ; Jaraiz, M.
Pub. info.: Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.163-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 568
10.

Conference Proceedings
Conference Proceedings
10. Experimental study on the mechanism of carbon diffusion in silicon
Cowern, N.E.B. ; Colombeau, B. ; Roozeboom, F. ; Hopstaken, M. ; Snijders, H. ; Meunier-Beillard, P. ; Lerch, W.
Pub. info.: Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A..  pp.255-262,  2002.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 717
11.

Conference Proceedings
Conference Proceedings
11. High-Density, Low-Loss MOS Decoupling Capacitors Integrated in a GSM Power Amplifier
Roozeboom, F. ; Kemmeren, A. ; Verhoeven, J. ; van den Heuvel, E. ; Kretschman, H. ; Fric, T.
Pub. info.: Materials, integration and packaging issues for high-frequency devices.  pp.157-164,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 783
12.

Conference Proceedings
Conference Proceedings
12. The Role of Preamorphization and Activation for Ultra Shallow Junction Formation on Strained Si Layers Grown on SiGe Buffer
Pawlak, B.J. ; Vandervorst, W. ; Lindsay, R. ; Wolf, I.De ; Roozeboom, F. ; Delhougne, R. ; Benedetti, A. ; Loo, R. ; Caymax, M. ; Maex, K. ; Cowern, N.E.B.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.281-286,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
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Conference Proceedings
Conference Proceedings
13. Dopant Diffusion in Amorphous Silicon
Duffy, R. ; Venezia, V.C. ; Heringa, A. ; Hopstaken, M.J.P. ; Maas, G.C.J. ; Dao, T. ; Tamminga, Y. ; Roozeboom, F.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.437-442,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
14.

Conference Proceedings
Conference Proceedings
14. The Role of Preamorphization and Activation for Ultra-Shallow Junction Formation on Strained Si Layers Grown on SiGe Buffer
Pawlak, B.J. ; Vandervorst, W. ; Lindsay, R. ; Wolf, I.De ; Roozeboom, F. ; Delhougne, R. ; Benedetti, A. ; Loo, R. ; Caymax, M. ; Maex, K. ; Cowern, N.E.B.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.423-430,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
15.

Conference Proceedings
Conference Proceedings
15. More Than 'Moore': Towards Passive and Si-Based System-In-Package Integration (Invited)
Roozeboom, F. ; Kemmeren, A.L.A.M. ; Verhoeven, J.F.C. ; van, F.C. ; Heuvel, den ; Klootwijk, J. ; Kretschman, H. ; Fric, T. ; van Grunsven, E.C.E. ; Bardy, S. ; Bunel, C. ; Chevrie, D. ; LeCornec, F. ; Ledain, S. ; Murray, F. ; Philippe, P.
Pub. info.: Microelectronics technology and devices : SBMICRO 2005 : proceedings of the twentieth international symposium.  pp.16-31,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-08
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Conference Proceedings
Conference Proceedings
16. High Temperature Stability of High-K Dielectrics: Thermal Processing and Kinetics
Young, E.W.A. ; Chen, J. ; Cosnier, V. ; Lysagh, P. ; Maes, J.W. ; Roozeboom, F. ; Zhao, C. ; Carter, R. ; Richard, O. ; Conard, T.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.125-136,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11
17.

Conference Proceedings
Conference Proceedings
17. Control Of A Metal-Electrode Work-Function By Solid-State Diffusion Of Nitrogen
Lander, R.J.P. ; Hooker, J.C. ; Zijl, J.P. van ; Roozeboom, F. ; Maas, M.P.M. ; Tamminga, Y. ; Wolters, R.A.M.
Pub. info.: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.253-260,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 716
18.

Conference Proceedings
Conference Proceedings
18. Plasma-Assisted Atomic Layer Deposition of TiN Films at Low Process Temperature for High-Aspect Ratio Applications
Heil, S.B.S. ; Langereis, E. ; Roozeboom, F. ; Kemmere, A. ; Pham, N.P. ; Sarro, P.M. ; van-de-Sanden, M.C.M. ; Kessels, W.M.M.
Pub. info.: Materials, technology and reliability of advanced interconnects - 2005 : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A..  pp.215-220,  2005.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 863
19.

Conference Proceedings
Conference Proceedings
19. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.747-760,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
20.

Conference Proceedings
Conference Proceedings
20. The (001) Surface of Fe3O4 Grown Epitaxially on MgO and Characterized by Scanning Tunneling Microscopy
Gaines, J. M. ; Kohlhepp, J. T. ; Eemeren, J. T. W. M. van ; Elfrink, R. J. G. ; Roozeboom, F. ; Jonge, W. J. M. de
Pub. info.: Epitaxial oxide thin films III : symposium held March 31-April 2, 1997, San Francisco, California, U.S.A..  pp.191-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 474
21.

Conference Proceedings
Conference Proceedings
21. GIANT MAGNETORESISTANCE AND STRUCTURAL STUDY OF PERMALLOY/SILVER MULTILAYERS DURING RAPID THERMAL ANNEALING
Roozeboom, F. ; Gideonse, I. ; Duchateau, J. P. W. B. ; Neerinck, D. G. ; Munsters, H. T.
Pub. info.: Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A..  pp.77-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 342
22.

Conference Proceedings
Conference Proceedings
22. UV Photoannealing and RTP of Thin Sol-Gel Films
Leest, R. E. Van de ; Roozeboom, F.
Pub. info.: Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.193-,  1996.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 429