Wiaux, V. ; Bekaert, J. ; Chen, J.F. ; Hsu, S.D. ; Ronse, K.G. ; Socha, R.J. ; Vandenberghe, G. ; Van Den Broeke, D.J.
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Photomask and Next-Generation Lithography Mask Technology XI. pp.585-594, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Maurer, W. ; Wiaux, V. ; Jonckheere, R.M. ; Philipsen, V. ; Hoffmann, T. ; Verhaegen, S. ; Ronse, K.G. ; England, J.G. ; Howard, W.B.
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18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.175-181, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Wiaux, V. ; Montgomery, P.K. ; Vandenberghe, G. ; Monnoyer, P. ; Ronse, K.G. ; Conley, W. ; Litt, L.C. ; Lucas, K. ; Finders, J. ; Socha, R. ; Broeke, D.J.V.D.
Pub. info.:
Optical Microlithography XVI. Part One pp.270-281, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering