1.

Conference Proceedings
Conference Proceedings
1. OPC aware mask and wafer metrology
Maurer, W. ; Wiaux, V. ; Jonckheere, R.M. ; Philipsen, V. ; Hoffmann, T. ; Verhaegen, S. ; Ronse, K.G. ; England, J.G. ; Howard, W.B.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.175-181,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
2.

Conference Proceedings
Conference Proceedings
2. Analysis of the impact of reticle CD variations on the available process windows for a 100-nm CMOS process
Verhaegen, S. ; Vandenberghe, G. ; Jonckheere, R.M. ; Ronse, K.G.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.197-208,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889