1.

Conference Proceedings
Conference Proceedings
1. Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
Dammel, R.R. ; Sakamuri, R. ; Lee, S.-H. ; Rahman, M.D. ; Kudo, T. ; Romano, A.R. ; Rhodes, L.F. ; Lipian, J. ; Hacker, C. ; Barnes, D.A.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.101-109,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of novel fluorinated resist matrices for 157-nm lithography
Houlihan, F.M. ; Romano, A.R. ; Rentkiewicz, D. ; Sakamuri, R. ; Dammel, R.R. ; Conley, W. ; Rich, G.K. ; Miller, D. ; Rhodes, L.F. ; McDaniels, J.M. ; Chang, C.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.22-32,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
3.

Conference Proceedings
Conference Proceedings
3. Baking study of fluorinated 157-nm resist
Houlihan, F.M. ; Sakamuri, R. ; Romano, A.R. ; Dammel, R.R. ; Conley, W. ; Rich, G.K. ; Miller, D. ; Rhodes, L.F. ; McDaniels, J.M. ; Chang, C.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.641-649,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039