1.

Conference Proceedings
Conference Proceedings
1. Dissolution inhibitors for 157-nm microlithography
Conley, W. ; Miller, D.A. ; Chambers, C.R. ; Osborn, B.P. ; Hung, R.J. ; Tran, H.V. ; Trinque, B.C. ; Pinnow, M.J. ; Chiba, T. ; McDonald, S. ; Zimmerman, P. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.69-75,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Negative photoresist for 157-nm microlithography: a progress report
Conley, W. ; Trinque, B.C. ; Miller, D.A. ; Zimmerman, P. ; Kudo, T. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.94-100,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Evaluation of novel fluorinated resist matrices for 157-nm lithography
Houlihan, F.M. ; Romano, A.R. ; Rentkiewicz, D. ; Sakamuri, R. ; Dammel, R.R. ; Conley, W. ; Rich, G.K. ; Miller, D. ; Rhodes, L.F. ; McDaniels, J.M. ; Chang, C.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.22-32,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
4.

Conference Proceedings
Conference Proceedings
4. Baking study of fluorinated 157-nm resist
Houlihan, F.M. ; Sakamuri, R. ; Romano, A.R. ; Dammel, R.R. ; Conley, W. ; Rich, G.K. ; Miller, D. ; Rhodes, L.F. ; McDaniels, J.M. ; Chang, C.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.641-649,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039