1.

Conference Proceedings
Conference Proceedings
1. Complementary double-exposure technique (CODE): a way to print 80-nm gate level using a double-exposure binary mask approach
Manakli, S. ; Trouiller. Y. ; Toublan, O. ; Schiavone, P. ; Miramond, C. ; Rody, Y.F. ; Sundermann, F. ; Chapon, J.D. ; Goirand, P.-J.
Pub. info.: Optical Microlithography XV.  Part One  pp.491-502,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. ArF imaging with off-axis illumination and subresolution asist bars: a compromise between mask constraints an lithographic process constraints
Trouiller, Y. ; Serrand, J. ; Miramond, C. ; Rody, Y.F. ; Manakli, S. ; Goirand, P.-J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1522-1529,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Critical failure ORC: application to the 90-nm and 65-nm nodes
Belledent, J. ; Shang, S.D. ; Trouiller, Y. ; Miramond, C. ; Patterson, K. ; Toublan, O.R. ; Couderc, C. ; Sundermann, F. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1184-1197,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377