1.

Conference Proceedings
Conference Proceedings
1. Gate imaging for 0.09-μm logic technology: comparison of single exposure with assist bars and the CODE approach
Trouiller, Y. ; Belledent, J. ; Chapon, J.D. ; Rousset, V. ; Rody, Y.F. ; Manakli, S. ; Goirand, P.-J.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1231-1240,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. MEV as a new constraint for lithographers in the sub-100-nm regime
Trouiller, Y. ; Postnikov, S.V. ; Lucas, K.D. ; Sundermann, F. ; Patterson, K. ; Belledent, J. ; Couderc, C. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1081-1092,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
3.

Conference Proceedings
Conference Proceedings
3. Critical failure ORC: application to the 90-nm and 65-nm nodes
Belledent, J. ; Shang, S.D. ; Trouiller, Y. ; Miramond, C. ; Patterson, K. ; Toublan, O.R. ; Couderc, C. ; Sundermann, F. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1184-1197,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377