Rittersma, Z.M. ; Massoubre, D. ; Roozeboorn, F. ; Verheijen, M.A. ; van Berkum, J.G.M ; Tamminga, Y. ; Dao, F. ; Snijders, J.H.M ; Vainonen-Ahigren, E. ; Fois, F. ; Tuominen, M. ; Haukka, S.
Pub. info.:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.273-280, 2003. Pennington, NJ. Electrochemical Society
Karakaya, K. ; Zinine, A. ; van Berkum, J.G.M. ; Croat, P. ; Verheijen, M.A. ; Rittersma, Z.M. ; Rijnders, G. ; Blank, D.H.A.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.331-338, 2005. Pennington, NJ. Electrochemical Society