1.

Conference Proceedings
Conference Proceedings
1. Considering mask pellicle effect for more accurate OPC model at 45nm technology node
C.-H. Wang ; Q. Liu ; L. Zhang
Pub. info.: Lithography Asia 2008.  2  pp.71403R-1-71403R-5,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
2.

Conference Proceedings
Conference Proceedings
2. Accelerate OPC convergence with new iteration control methodology
C.-H. Wang ; Q. Liu ; L. Zhang
Pub. info.: Photomask technology 2008.  2  pp.712240-1-712240-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
3.

Conference Proceedings
Conference Proceedings
3. Optimized OPC approach for process window improvement
C.-H. Wang ; Q. Liu ; L. Zhang
Pub. info.: Optical Microlithography XXI.  3  pp.69243E-1-69243E-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
4.

Conference Proceedings
Conference Proceedings
4. More robust model built using SEM calibration
C.-H. Wang ; Q. Liu ; L. Zhang
Pub. info.: Photomask technology 2007.  3  pp.673053-1-673053-7,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
5.

Conference Proceedings
Conference Proceedings
5. An approach of auto-fix post OPC hot spots
C.-H. Wang ; Q. Liu ; L. Zhang
Pub. info.: Photomask technology 2007.  3  pp.67304Z-1-67304Z-5,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730