1.

Conference Proceedings
Conference Proceedings
1. Potentials of online scanning electron microscope performance analysis using NIST reference material 8091
Postek,M.T. ; Vladar,A.E. ; Zhang,N.-F. ; Larrabee,R.D.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.28-37,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. New algorithm for the measurement of pitch in metrology instruments
Zhang,N.F. ; Postek,M.T. ; Larrabee,R.D. ; Carroll,L. ; Keery,W.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.147-158,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
3.

Conference Proceedings
Conference Proceedings
3. Statistical measure for the sharpness of SEM images
Zhang,N.F. ; Postek,M.T. ; Larrabee,R.D. ; Vladar,A.E. ; Keery,W.J. ; Jones,S.N.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.375-387,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
4.

Conference Proceedings
Conference Proceedings
4. Reference Material 8091: new scanning electron microscope sharpness standard
Vladar,A.E. ; Postek,M.T. ; Zhang,N.-F. ; Larrabee,R.D. ; Jones,S.N. ; Hajdaj,R.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.827-834,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344