1.

Conference Proceedings
Conference Proceedings
1. Impact of optical enhancement techniques on the mask error enhancement function(MEEF)
Plat,M.V. ; Nguyen,K.B. ; Spence,C.A. ; Lyons,C.F. ; Wilkison,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.206-214,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers
Spence,C.A. ; Plat,M.V. ; Sahouria,E.Y. ; Cobb,N.B. ; Schellenberg,F.M.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.277-287,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers
Spence,C.A. ; Plat,M.V. ; Sahouria,E.Y. ; Cobb,N.B. ; Schellendberg,F.M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.650-660,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
4.

Conference Proceedings
Conference Proceedings
4. Resolution capability and the mask error enhancement function (MEEF) for ArF and KrF lithography
Plat,M.V. ; Spence,C.A. ; Lyons,C.F. ; Wilkison,A.
Pub. info.: Optical Microlithography XIV.  4346  pp.851-857,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346