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Conference Proceedings

1. Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers

Spence,C.A. ; Plat,M.V. ; Sahouria,E.Y. ; Cobb,N.B. ; Schellenberg,F.M.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.277-287, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

2. Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers

Spence,C.A. ; Plat,M.V. ; Sahouria,E.Y. ; Cobb,N.B. ; Schellendberg,F.M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.650-660, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066