1.

Conference Proceedings
Conference Proceedings
1. Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides
Verhaverbeke, S. ; Meuris, M. ; Mertens, P. ; Schmidt, H. ; Heyns, M.M. ; Philipossian, A. ; Graeff, D. ; Dillenbeck, K.
Pub. info.: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993.  pp.199-219,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-13
2.

Conference Proceedings
Conference Proceedings
2. Fluid Dynamics Considerations In Ultra-Thin SiO2 Process Development
Philipossian, A. ; Van Wormer, K.
Pub. info.: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.285-294,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-16
3.

Conference Proceedings
Conference Proceedings
3. Temperature Measurement Studies In Atmospheric Thermal Silicon Oxidation Reactors
Philipossian, A. ; Van Wormer, K.
Pub. info.: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.267-275,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-16
4.

Conference Proceedings
Conference Proceedings
4. A Technique for Measuring Slurry-Flow Dynamics During Chemical Mechanical Polishing
Coppeta, J. ; Rogers, C. ; Philipossian, A. ; Kaufman, F.
Pub. info.: Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A..  pp.95-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 447
5.

Conference Proceedings
Conference Proceedings
5. Investigation of Pre-Tungsten Silicide Deposition Wet Chemical Processing
Philipossian, A. ; Moinpour, M. ; Wilkinson, R. ; Watt, V. H. C.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.75-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
6.

Conference Proceedings
Conference Proceedings
6. Current Issues and Future Trends in CMP Consumables for Oxide and Metal Polish
Moinpour, M. ; Philipossian, A.
Pub. info.: Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A..  pp.243-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 427
7.

Conference Proceedings
Conference Proceedings
7. Tribology of the ILD CMP Process During Pad Glazing and Conditioning - L. Chains and A. 2 Philipossian
Chains, L. ; Philipossian, A.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.2-12,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-1
8.

Conference Proceedings
Conference Proceedings
8. Analytical and Functional Characterization of Recycled Fumed Silica Slurries in ILD CMP
Levy, P. ; Rader, S. ; Lefevre, P. ; Ina, K. ; Shadman, F. ; Sugiysma, M. ; Philipossian, A.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.266-272,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-21
9.

Conference Proceedings
Conference Proceedings
9. The Spectral Fingerprints and the Sounds of CMP
Rosales-Yeomans, D. ; Doy, T. ; Philipossian, A.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.223-232,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-21
10.

Conference Proceedings
Conference Proceedings
10. Determining the Effects of Slurry Surfactant, Abrasive Size and Content on the Tribology and Kinetics of Copper CMP
Li, Z. ; Ina, K. ; Lefevrc, P. ; Philipossian, A.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.92-103,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-21
11.

Conference Proceedings
Conference Proceedings
11. Effect of Novel Pad Texture Designs on Tribology and Removal Rate Characteristics of ILD CMP
Doy, T. ; Kinoshita, M. ; Philipossian, A.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.165-172,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-21
12.

Conference Proceedings
Conference Proceedings
12. Heating and Convection in Copper Polishing
Borucki, L. ; Li, Z. ; Philipossian, A.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.61-67,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-21
13.

Conference Proceedings
Conference Proceedings
13. Analysis of Frictional Heating of Grooved and Flat CMP Polishing Pads
Borucki, L. ; Charns, L. ; Philipossian, A.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.173-181,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-21
14.

Conference Proceedings
Conference Proceedings
14. Comparison of Copper Disc and Copper Wafer Polishing Processes in of Terms their Kinetic, Tribological
Li, Z. ; Rader, S. ; Lefevre, P. ; Ina, K. ; Philipossian, A.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.35-43,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-21
15.

Conference Proceedings
Conference Proceedings
15. A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES
Meuris, M. ; Verhaverbeke, S. ; Mertens, P.W. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Heyns, M.M. ; Philipossian, A.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.15-25,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
16.

Conference Proceedings
Conference Proceedings
16. Real Time Measurement of Temperature In The Pad Wafer Region During CMP
Comely, J. ; Rogers, C. ; Manno, V. ; Philipossian, A.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.184-192,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-1
17.

Conference Proceedings
Conference Proceedings
17. Mean Residence Time Analysis of CMP Processes
Philipossian, A. ; Mitchel, E.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.166-175,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-1
18.

Conference Proceedings
Conference Proceedings
18. NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES
Heyns, M. M. ; Verhaverbeke, S. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. ; Kubota, M. ; Philipossian, A. ; Dillenbeck, K. ; Graf, D. ; Schnegg, A. ; Blank, R. de
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.35-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315