1.

Conference Proceedings
Conference Proceedings
1. Tunable AR for DUV lithography
Pavelchek,E.K. ; doCanto,M.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.932-943,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
2.

Conference Proceedings
Conference Proceedings
2. Planarization approaches to via-first dual-damascene processing
Pavelchek,E.K. ; Cernigliaro,M. ; Trefonas,P. ; doCanto,M.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.140-151,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
3.

Conference Proceedings
Conference Proceedings
3. Highly absorbing ARC for DUV lithography
Pavelchek,E.K. ; Meador,J.D. ; Guerrero,D.J. ; Lamb,J.E.III ; Kache,A. ; doCanto,M. ; Adams,T.G. ; Stark,D.R. ; Miller,D.A.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.692-699,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724