1.

Conference Proceedings
Conference Proceedings
1. Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes
Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.170-179,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Factors affecting pitch bias in lithography simulation
Robertson,S.A. ; Pavelchek,E.K. ; Swible-Keane,C.I. ; Bohiand,J.F. ; Reilly,M.T.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.744-758,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes
Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.
Pub. info.: Optical Microlithography XIV.  4346  pp.858-868,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346