1.

Conference Proceedings
Conference Proceedings
1. Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes
Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.170-179,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Simulation of 193-nm photoresists based on different polymer platforms
Kang,D. ; Robertson,S.A. ; Pavelchek,E.K.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.936-944,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
3.

Conference Proceedings
Conference Proceedings
3. Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes
Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.
Pub. info.: Optical Microlithography XIV.  4346  pp.858-868,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346