1.

Conference Proceedings
Conference Proceedings
1. Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions
Chen, T. ; Van Den Broeke, D. ; Park, S. ; Liebchen, A. ; Chen, J. F. ; Hsu, S. ; Park, J. C. ; Yu, L. ; Gronlund, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.434-444,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings
Conference Proceedings
2. RET masks for the final frontier of optical lithography [5853-104]
Chen, J. F. ; Broeke, D. van den ; Hsu, S. ; Hsu, M. C.W. ; Laidig, T. ; Shi, X. ; Chen, T. ; Socha, R. J. ; Hollerbach, U. ; Wampler, K. E. ; Park, J. ; Park, S. ; Gronlund, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.168-179,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853