1.

Conference Proceedings
Conference Proceedings
1. ArF issues of 90-nm-node DRAM device integration
Goo, D.-H. ; Kim, B.-S. ; Park, J.-S. ; Yoon, K.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1296-1303,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell
Lee, J.-H. ; Chung, D.-H. ; Cha, D.-C. ; Kim, H.-S. ; Park, J.-S. ; Nam, D.-G. ; Woo, S.-K. ; Cho, H.-S. ; Han, W.-S.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1253-1262,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography
Park, J.-S. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M. ; Lee, J.-H. ; Shin, H.-S. ; Laidig, T.L. ; Van den Broeke, D.J. ; Chen, J.F.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.112-121,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256