1.

Conference Proceedings
Conference Proceedings
1. Study of Over-polishing at the Edge of a Pattern in Selective CMP
Park, J.-H. ; Park, D.-W. ; Lee, J.-D. ; Hong, C. ; Han, W.-S. ; Moon., J.-T.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.283-289,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-21
2.

Conference Proceedings
Conference Proceedings
2. Advanced module-based approach to effective CD prediction of sub-100nm patterns
Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.65-73,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
3.

Conference Proceedings
Conference Proceedings
3. Modified procedure for evaluation of low-k1 process windows
Park, D.-W. ; Lee, S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1422-1426,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377