1.

Conference Proceedings
Conference Proceedings
1. Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process
Park, D.-I. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.78-85,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing
Kim, Y.-D. ; Lee, D.-S. ; Park, D.-I. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.392-399,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
3.

Conference Proceedings
Conference Proceedings
3. Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production
Jeong, W.-G. ; Park, D.-I. ; Park, E.-S. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.157-167,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. A study of post-exposure baking effect for CAR process in photomask fabrication
Park, D.-I. ; Seo, S.-K. ; Jeong, W.-G. ; Park, E.-S. ; Lee, J.-H. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.190-196,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130