1.

Conference Proceedings
Conference Proceedings
1. Implementation of contact hole patterning performance with KrF resist flow process for 80nm DRAM application
Kim, H. ; Park, D.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1430-1436,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Implementation of contact hole patterning performance with KrF resist flow process for 60nm node DRAM application [6154-155]
Kim, H. ; Ahn, Y. B. ; Kim, J. ; Kim, S. ; Park, D. ; Kim, Y. -S.
Pub. info.: Optical Microlithography XIX.  pp.615441-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154