1.

Conference Proceedings
Conference Proceedings
1. Deep anisotropic ICP plasma etching designed for high-volume MEMS manufacturing
Yu,K. ; Feldbaum,M. ; Pandhumsoporn,T. ; Gadgil,P.
Pub. info.: Micromachining and microfabrication process technology V : 20-22 September, 1999, Santa Clara, California.  pp.218-226,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3874
2.

Conference Proceedings
Conference Proceedings
2. Etching technology and applications for through-the-wafer silicon etching
Craven,D.R. ; Yu,K. ; Pandhumsoporn,T.
Pub. info.: Micromachining and microfabrication process technology : 23-24 October, 1995, Austin, Texas.  pp.259-263,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2639