1.

Conference Proceedings
Conference Proceedings
1. Desirable reticle flatness from focus deviation standpoint in optical lithography
Inoue, S. ; Itoh, M. ; Asano, M. ; Okumura, K. ; Hagiwara, T. ; Moriya, J.
Pub. info.: Optical Microlithography XV.  Part One  pp.530-540,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Analysis of wafer flatness for CD control in photolithography
Fujisawa, T. ; Asano, M. ; Sutani, T. ; Inoue, S. ; Yamada, H. ; Sugamoto, J. ; Okumura, K. ; Hagiwara, T. ; Oka, S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.802-809,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691