1.

Conference Proceedings
Conference Proceedings
1. Silsesquioxane-based 193 nm bilayer resists: characterization and lithographic evaluation
Bravo-Vasquez, J. P. ; Kwark, Y.-J. ; Ober, C. K. ; Cao, H. B. ; Deng, H.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.109-121,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Molecular glass resists for next-generation lithography [6153-50]
Bratton, D. ; Ayothi, R. ; Felix, N. ; Cao, H. ; Deng, H. ; Ober, C. K.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61531D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153