1.

Conference Proceedings
Conference Proceedings
1. Block copolymers as additives: a route to enhanced resist performance
Sundararajan, N. ; Ogino, K. ; Valiyaveettil, S. ; Wang, J. ; Yang, S. ; Kameyama, A. ; Ober, C. K. ; Allen, R. D. ; Byers, J. D.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.78-85,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Polymer-platform-dependent characteristics of 193-nm photoresists
Opitz, J. ; Allen, R. D. ; Breyta, G. ; Hofer, D. C. ; Sundararajan, N. ; Ober, C. K.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1096-1105,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678