1.

Conference Proceedings
Conference Proceedings
1. Stability of CrFx films for phase-shifting mask
Kim,E. ; Hong,S. ; Jiang,Z.-T. ; Lim,S. ; Woo,S.-G. ; Koh,Y.-B. ; No,K.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.294-297,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Simulation study and fabrication of high-transmittance attenuated phase-shifting mask
Kim,E. ; Hong,S. ; Moon,S. ; Kim,Y. ; Yoon,H. ; No,K.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.928-936,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure
Hong,S. ; Kim,E. ; Jiang,Z.-T. ; Bae,B.-S. ; No,K. ; Shin,W. ; Lim,S.-C. ; Woo,S.-G. ; Koh,Y.-B.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.134-137,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
4.

Conference Proceedings
Conference Proceedings
4. High transmittance attenuated phase shifting mask of chromium aluminum oxynitride
Choi,E. ; Kim,E. ; Kim,H. ; Kim,Y. ; Tian,H. ; No,K.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.1141-1150,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562