1.

Conference Proceedings
Conference Proceedings
1. TITANIUM GERMANOSILICIDE: PHASE FORMATION, SEGREGATION, AND MORPHOLOGY
Aldrich, D. B. ; Chen, Y. L. ; Sayers, D. E. ; Nemanich, R. J.
Pub. info.: Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.305-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 320
2.

Conference Proceedings
Conference Proceedings
2. Titanium Germanosilicide Phase Formation During the Ti-Si1-xGex Solid Phase Reactions
Aldrich, D. B. ; Chen, Y. L. ; Sayers, D. E. ; Nemanich, R. J.
Pub. info.: Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA.  pp.405-,  1996.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 402
3.

Conference Proceedings
Conference Proceedings
3. A STUDY OF SURFACE AND SUBSURFACE PROPERTIES OF Si(100) AFTER HYDROGEN ION-BEAM EXPOSURE
Liu, H. X. ; Schneider, T. P. ; Montgomery, J. ; Chen, Y. L. ; Buczkowski, A. ; Shimura, F. ; Nemanich, R. J. ; Maher, D. M. ; Korzec, D. ; Engemann, J.
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.231-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
4.

Conference Proceedings
Conference Proceedings
4. PLASMA SURFACE INTERACTIONS AND SURFACE PRORERTIES FOR REMOTE H-PLASMA CLEANING OF Si(100)
Schneider, T. P. ; Cho, J. ; Chen, Y. L. ; Maher, D. M. ; Nemanich, R. J.
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.197-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
5.

Conference Proceedings
Conference Proceedings
5. Removal of SiO2 from Si(100) by Remote H2/SiH4 Plasma Prior to Epitaxial Growth
Barnak, J. P. ; Ying, H. ; Chen, Y. L. ; Montgomery, J. ; Nemanich, R. J.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.351-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
6.

Conference Proceedings
Conference Proceedings
6. RIE Passivation Layer Removal by Remote H-Plasma and H2/SiH4 Plasma Processing
Ying, Hong ; Barnak, J. P. ; Chen, Y. L. ; Nemanich, R. J.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.285-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
7.

Conference Proceedings
Conference Proceedings
7. PHASE FORMATIONS IN Co/Si, Co/Ge, AND Co/Si1-xGex BY SOLID PHASE REACTIONS
Wang, Z. ; Chen, Y. L. ; Ying, H. ; Nemanich, R. J. ; Sayers, D. E.
Pub. info.: Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.397-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 320