1.

Conference Proceedings
Conference Proceedings
1. How large MEEF is acceptable for the low-k1 lithography- [5992-97]
Nam, D. ; Lee, D. -G. ; Kim, B. ; Moon, S. -Y. ; Choi, S. -W. ; Han, W. -S.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922W-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Improved modeling of fogging and loading effect correction [5992-165]
Lee, S. ; Kim, B. ; Han, H. ; Nam, D. ; Moon, S. ; Choi, S. ; Han, W.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924U-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. Required mask specification for mass production devices below 65-nm design node [6349-81]
Nam, D. ; Choi, S. ; Doh, J. ; Noh, Y. ; Lee, H. ; Sin, Y. ; Kim, B. ; Kang, M. ; Han, W.
Pub. info.: Photomask Technology 2006.  pp.634928-634928,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349