1.

Conference Proceedings
Conference Proceedings
1. Lithography manufacturing implementation for 65 nm and 45 nm nodes with model-based scattering bars using IML technology
Nam, D. ; Milster, T. D. ; Chen, T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.355-367,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Maskless lithography with the solid immersion lens nano probes
Milster, T. ; Chen, T. ; Nam, D. ; Schlesinger, T. E.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.545-556,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567