Lee, D. ; Roman, P. ; Mumbauer, P. ; Grant, R. ; Horn, M. ; Ruzyllo, J.
Pub. info.:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium. pp.237-242, 2000. Pennington, N.J.. Electrochemical Society
Roman, P. ; Lee, D. ; Mumbauer, P. ; Grant, R. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium. pp.187-192, 2000. Pennington, N.J.. Electrochemical Society
Chang, K. ; Shanmugasundaram, K. ; Lee, D.-O. ; Roman, P. ; Shallenberger, J. ; Chang, F.-M. ; Wang, J. ; Beck, R. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
Pub. info.:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.78-85, 2003. Pennington, NJ. Electrochemical Society
Chang, K. ; Shallenberger, J. ; Chang, F.-M. ; Shanmugasundaram, K. ; Roman, P. ; Mumbauer, P. ; Ruzyllo, J.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.404-410, 2005. Pennington, NJ. Electrochemical Society
Roman, P. ; Lee, D.-O. ; Wang, J. ; Wu, C.-T. ; Subramanian, V. ; Brubaker, M. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
Pub. info.:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.241-248, 2001. Pennington, N.J.. Electrochemical Society