1.

Conference Proceedings
Conference Proceedings
1. ArF immersion lithography using TWINSCAN technology
Mulkens, J. ; Streefkerk, B. ; Haagendorp, M.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.196-207,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
2.

Conference Proceedings
Conference Proceedings
2. The next phase for immersion lithography [6154-06]
Sewell, H. ; Mulkens, J. ; McCafferty, D. ; Markoya, L. ; Streefkerk, B. ; Graeupner, P.
Pub. info.: Optical Microlithography XIX.  pp.615406-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Extending optical lithography with immersion
Streefkerk, B. ; Baselmans, J. ; Gehoel-van Ansem, W. ; Mulkens, J. ; Hoogendam, C. ; Hoogendorp, M. ; Flagello, D.G. ; Sewell, H. ; Graupner, P.
Pub. info.: Optical Microlithography XVII.  pp.285-305,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377