1.

Conference Proceedings
Conference Proceedings
1. The next phase for immersion lithography [6154-06]
Sewell, H. ; Mulkens, J. ; McCafferty, D. ; Markoya, L. ; Streefkerk, B. ; Graeupner, P.
Pub. info.: Optical Microlithography XIX.  pp.615406-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Extending optical lithography with immersion
Streefkerk, B. ; Baselmans, J. ; Gehoel-van Ansem, W. ; Mulkens, J. ; Hoogendam, C. ; Hoogendorp, M. ; Flagello, D.G. ; Sewell, H. ; Graupner, P.
Pub. info.: Optical Microlithography XVII.  pp.285-305,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
3.

Conference Proceedings
Conference Proceedings
3. Optical lithography with 157-nm technology
Modderman, T.M. ; Jasper, H. ; Boom, H. ; Uitterdijk, T. ; Dana, S. ; Sewell, H. ; O'Neil, T.K. ; Mulkens, J. ; Brunotte, M. ; Mecking, B. ; Gruner, T.
Pub. info.: Optical Microlithography XVII.  pp.816-826,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377