1.

Conference Proceedings
Conference Proceedings
1. Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system [6154-69]
Jasper, H. ; Modderman, T. ; Van de Kerkhof, M. ; Wagner, C. ; Mulkens, J. ; De. Bodij, W. ; Van Seten, E ; Kneer, B.
Pub. info.: Optical Microlithography XIX.  pp.61541W-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Optical lithography solutions for sub-65-nm semiconductor devices
Mulkens, J. ; McClay, J.A. ; Tirri, B.A. ; Brunotte, M. ; Mecking, B. ; Jasper, H.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.753-762,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Optical lithography with 157-nm technology
Modderman, T.M. ; Jasper, H. ; Boom, H. ; Uitterdijk, T. ; Dana, S. ; Sewell, H. ; O'Neil, T.K. ; Mulkens, J. ; Brunotte, M. ; Mecking, B. ; Gruner, T.
Pub. info.: Optical Microlithography XVII.  pp.816-826,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377