1.

Conference Proceedings
Conference Proceedings
1. Process margin in ArF lithography considering process window distortion
Okabe, I. ; Ohfuji, T. ; Endo, M. ; Morimoto, H.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.828-836,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Analysis of molecular diffusion in resist polymer films simulated by molecular dynamics
Toriumi, M. ; Ohfuji, T. ; Endo, M. ; Morimoto, H.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.368-379,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Theoretical analysis of line-edge roughness using FFT techniques
Ohfuji, T. ; Endo, M. ; Morimoto, H.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.732-738,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678