Complex mediums II : beyond linear isotropic dielectrics, 30 July-1 August, 2001, San Diego, USA. pp.387-394, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.404-414, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.350-358, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.60-72, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1087-1095, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1126-1134, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology VII. pp.523-530, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology VIII. pp.132-146, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology VIII. pp.555-562, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering