1.

Conference Proceedings
Conference Proceedings
1. Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure
Toyama,N. ; Miyashita,H. ; Morikawa,Y. ; Fujita,H. ; Iwase,K. ; Mohri,H. ; Hayashi,N. ; Sano,H.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.350-358,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. "Establishment of production processes and assurance method for alternating phase-shift masks (Best Poster Paper, BACUS 2000 Symposium)"
Murai,S.M. ; Koizumi,Y. ; Kamibayashi,T. ; Saitou,H. ; Hoga,M. ; Morikawa,Y. ; Miyashita,H.
Pub. info.: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.60-72,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4349
3.

Conference Proceedings
Conference Proceedings
3. Improvement of alt-PSM production process using backside phase-measurement method
Saitou,H. ; Koizumi,Y. ; Sanki,S. ; Kamibayashi,T. ; Murai,S.M. ; Miyashita,H. ; Fujita,H. ; Morikawa,Y. ; Nara,M. ; Hayashi,N. ; Hoga,M.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.1087-1095,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
4.

Conference Proceedings
Conference Proceedings
4. Establishment of production process and assurance method for alternating phase-shift masks
Murai,S.M. ; Koizumi,Y. ; Kamibayashi,T. ; Saitou,H. ; Hoga,M. ; Morikawa,Y. ; Miyashita,H.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.890-901,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. 100-nm alternating PSM structure discussion for ArF lithography
Morikawa,Y. ; Kokubo,H. ; Nara,M. ; Miyashita,H. ; Hayashi,N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.132-146,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409