1.

Conference Proceedings
Conference Proceedings
1. Requirement of in-field illumination control for low k1 imaging below 0.3
Hwang, C. ; Shin, J. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1548-1556,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Advanced module-based approach to effective CD prediction of sub-100nm patterns
Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.65-73,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
3.

Conference Proceedings
Conference Proceedings
3. A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns
Lee, S. ; Hwang, C. ; Park, D.-W. ; Kim, I.-S. ; Kim, H.-C. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.1413-1421,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377