1.

Conference Proceedings
Conference Proceedings
1. Progress of light source technologies from KrF laser to F2 laser
Mizoguchi,H.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.305-312,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Concept and design philosophy of a person-accompanying robot
Mizoguchi,H. ; Shigehara,T. ; Goto,Y. ; Hidai,K. ; Mishima,T.
Pub. info.: Mobile robots XIII and intelligent transportation systems.  pp.73-79,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3525
3.

Conference Proceedings
Conference Proceedings
3. High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge
Enami,T. ; Wakabayashi,O. ; Nishisaka,T. ; Suzuki,N. ; Nire,T. ; Mizoguchi,H. ; Nakarai,H. ; Tanaka,H. ; Ariga,T. ; Shio,K. ; Okamoto,T. ; Noudomi,R. ; Tomaru,H. ; Nakao,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.1031-1040,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
4.

Conference Proceedings
Conference Proceedings
4. Billion-level durable ArF excimer laser with highly stable energy
Wakabayashi,O. ; Enami,T. ; Ohta,T. ; Tanaka,H. ; Kubo,H. ; Suzuki,T. ; Terashima,K. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1058-1068,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
5.

Conference Proceedings
Conference Proceedings
5. Performance of a highly stable 2-kHz-operation KrF Laser
Enami,T. ; Nakano,M. ; Watanabe,T. ; Ohbo,A. ; Hori,T. ; Ito,T. ; Nishisaka,T. ; Sumitani,A. ; Wakabayashi,O. ; Mizoguchi,H. ; Nakarai,H. ; Hisanaga,N. ; Matsunaga,T. ; Tanaka,H. ; Sakanishi,S. ; Okamoto,T. ; Noudomi,R. ; Suzuki,T. ; Takabayashi,Y.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1076-1084,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
6.

Conference Proceedings
Conference Proceedings
6. Virtual video tape:a novel development tool real-time motion image understanding
Parallel and distributed methods for image processing IV
Pub. info.: Parallel and distributed methods for image processing.  pp.30-37,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4118
7.

Conference Proceedings
Conference Proceedings
7. High-resolution multigrating spectrometer for high-quality deep-UV light source production
Suzuki,T. ; Nakaike,T. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1452-1460,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
8.

Conference Proceedings
Conference Proceedings
8. Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography
Enami,T. ; Wakabayashi,O. ; Ishii,K. ; Terashima,K. ; Itakura,Y. ; Watanabe,T. ; Ohta,T. ; Ohbu,A. ; Kubo,H. ; Tanaka,H. ; Suzuki,T. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1435-1444,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
9.

Conference Proceedings
Conference Proceedings
9. Output stabilization technology With chemical impurity control on ArF excimer laser
Sumitani,A. ; Andou,S. ; Watanabe,T. ; Konishi,M. ; Egawa,S. ; Uchino,I. ; Ohta,T. ; Terashima,K. ; Suzuki,N. ; Enami,T. ; Mizoguchi,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1424-1434,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
10.

Conference Proceedings
Conference Proceedings
10. In-situ measurement of VUV optical materials under F2 laser irradiation
Itakura,Y. ; Sumitani,A. ; Yoshida,F. ; Kawasa,Y. ; Zhang,J. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Second International Symposium on Laser Precision Microfabrication : 16-18 May 2001, Singapore.  pp.475-478,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4426
11.

Conference Proceedings
Conference Proceedings
11. Evaluation of characteristics of VUV optical materials irradiated by F2 laser
Itakura,Y. ; Yoshida,F. ; Kawasa,Y. ; Sumitani,A. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan.  pp.205-208,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4088
12.

Conference Proceedings
Conference Proceedings
12. Ultra-line-narrowed F2 laser for microlithography
Komori,H. ; Ariga,T. ; Watanabe,H. ; Kumazaki,T. ; Kitatochi,N. ; Sasano,K. ; Ueno,Y. ; Nishisaka,T. ; Nohdomi,R. ; Hotta,K. ; Mizoguchi,H. ; Nakao,K.
Pub. info.: Second International Symposium on Laser Precision Microfabrication : 16-18 May 2001, Singapore.  pp.424-428,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4426
13.

Conference Proceedings
Conference Proceedings
13. High-repetition-rate fluorine laser for microlithography
Fujimoto,J. ; Nagai,S. ; Shio,K. ; Iwata,Y. ; Takehisa,K. ; Nishisaka,T. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1560-1567,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
14.

Conference Proceedings
Conference Proceedings
14. Interruption-free construction of a firewall for research network
Mizoguchi,H. ; Teshiba,M. ; Hiraoka,K. ; Shigehara,T. ; Mishima,T.
Pub. info.: Critical technologies for the future of computing : 31 July-4 August 2000, San Diego, USA.  pp.289-295,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4109
15.

Conference Proceedings
Conference Proceedings
15. Robust face detection for human interactive mobile robot
Hidai,K. ; Kanamori,T. ; Mizoguchi,H. ; Hiraoka,K. ; Tanaka,M. ; Shigehara,T. ; Mishima,T.
Pub. info.: Mobile robots XV and telemanipulator and telepresence technologies VII : 5-6 November 2000, Boston, USA.  pp.171-180,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4195
16.

Conference Proceedings
Conference Proceedings
16. High-repetition-rate ArF excimer laser for microlithography
Wakabayashi,O. ; Enami,T. ; Ishii,K. ; Terashima,K. ; Itakura,Y. ; Watanabe,T. ; Ohta,T. ; Ohbu,A. ; Kubo,H. ; Tanaka,H. ; Andou,S. ; Matsunga,T. ; Umeda,H. ; Suzuki,T. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan.  pp.191-194,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4088
17.

Conference Proceedings
Conference Proceedings
17. Acoustic focusing by microphone array for human interactive mobile robot
Mizoguchi,H. ; Kato,Y. ; Hiraoka,K. ; Tanaka,M. ; Shigehara,T. ; Mishima,T.
Pub. info.: Mobile robots XV and telemanipulator and telepresence technologies VII : 5-6 November 2000, Boston, USA.  pp.151-158,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4195
18.

Conference Proceedings
Conference Proceedings
18. Progress of excimer laser technologies
Mizoguchi,H.
Pub. info.: Microlithographic Techniques in Integrated Circuit Fabrication II.  pp.16-26,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4226
19.

Conference Proceedings
Conference Proceedings
19. Subpicometer ArF excimer laser for 193-nm lithography
Akita,J. ; Komori,H. ; Kouda,N. ; Yoshioka,S. ; Itakura,Y. ; Mizoguchi,H.
Pub. info.: Optical Microlithography X.  pp.890-898,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
20.

Conference Proceedings
Conference Proceedings
20. Spectral measurement of ultra line-narrowed F2 laser
Wakabayashi,O. ; Sakuma,J. ; Suzuki,T. ; Kubo,H. ; Kitatochi,N. ; Suganuma,T. ; Nakaike,T. ; Kumazaki,T. ; Hotta,K. ; Mizoguchi,H. ; Nakao,K. ; Togashi,T. ; Nabekawa,Y. ; Watanabe,S.
Pub. info.: Optical Microlithography XIV.  4346  pp.1066-1073,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
21.

Conference Proceedings
Conference Proceedings
21. Evaluation of characteristics of VUV optical materials irradiated by F2 laser
Itakura,Y. ; Yoshida,F. ; Kawasa,Y. ; Sumitani,A. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Optical Microlithography XIV.  4346  pp.1088-1094,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
22.

Conference Proceedings
Conference Proceedings
22. High-resolution multigrating spectrometer for high-quality deep-UV light source production
Suzuki,T. ; Kubo,H. ; Suganuma,T. ; Yamashita,T. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Optical Microlithography XIV.  4346  pp.1254-1261,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
23.

Conference Proceedings
Conference Proceedings
23. Challenge of the F2 laser for dioptric projection system
Ariga,T. ; Watanabe,H. ; Kumazaki,T. ; Kitatochi,N. ; Sasano,K. ; Ueno,Y. ; Nishisaka,T. ; Nohdomi,R. ; Hotta,K. ; Mizoguchi,H. ; Nakao,K.
Pub. info.: Optical Microlithography XIV.  4346  pp.1158-1165,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
24.

Conference Proceedings
Conference Proceedings
24. Long-run-time performance characteristics of a line-selected 2-kHz F2 laser for optical microlithography
Soumagne,G. ; Nagai,S. ; Hisanaga,N. ; Nanzai,S. ; Ochiishi,Y. ; Ohbu,A. ; Fujimoto,J. ; Mizoguchi,H.
Pub. info.: Optical Microlithography XIV.  4346  pp.1137-1144,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
25.

Conference Proceedings
Conference Proceedings
25. 1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage
Enami,T. ; Ohta,T. ; Tanaka,H. ; Kubo,H. ; Suzuki,T. ; Sunaka,F. ; Terashima,K. ; Sumitani,A. ; Kawasa,Y. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Laser-Induced Damage in Optical Materials: 1998.  pp.31-42,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3578
26.

Conference Proceedings
Conference Proceedings
26. High-power KrF excimer laser with a solid state switch for microlithography
Mizoguchi,H. ; Ito,N. ; Nakarai,H. ; Kobayashi,Y. ; Itakura,Y. ; Komori,H. ; Wakabayashi,O. ; Aruga,T. ; Sakugawa,T. ; Koganezawa,T.
Pub. info.: Optical Microlithography IX.  Part2  pp.831-840,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726