1.

Conference Proceedings
Conference Proceedings
1. Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography
Enami,T. ; Wakabayashi,O. ; Ishii,K. ; Terashima,K. ; Itakura,Y. ; Watanabe,T. ; Ohta,T. ; Ohbu,A. ; Kubo,H. ; Tanaka,H. ; Suzuki,T. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1435-1444,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. In-situ measurement of VUV optical materials under F2 laser irradiation
Itakura,Y. ; Sumitani,A. ; Yoshida,F. ; Kawasa,Y. ; Zhang,J. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Second International Symposium on Laser Precision Microfabrication : 16-18 May 2001, Singapore.  pp.475-478,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4426
3.

Conference Proceedings
Conference Proceedings
3. Evaluation of characteristics of VUV optical materials irradiated by F2 laser
Itakura,Y. ; Yoshida,F. ; Kawasa,Y. ; Sumitani,A. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan.  pp.205-208,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4088
4.

Conference Proceedings
Conference Proceedings
4. High-repetition-rate ArF excimer laser for microlithography
Wakabayashi,O. ; Enami,T. ; Ishii,K. ; Terashima,K. ; Itakura,Y. ; Watanabe,T. ; Ohta,T. ; Ohbu,A. ; Kubo,H. ; Tanaka,H. ; Andou,S. ; Matsunga,T. ; Umeda,H. ; Suzuki,T. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan.  pp.191-194,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4088
5.

Conference Proceedings
Conference Proceedings
5. Subpicometer ArF excimer laser for 193-nm lithography
Akita,J. ; Komori,H. ; Kouda,N. ; Yoshioka,S. ; Itakura,Y. ; Mizoguchi,H.
Pub. info.: Optical Microlithography X.  pp.890-898,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
6.

Conference Proceedings
Conference Proceedings
6. Evaluation of characteristics of VUV optical materials irradiated by F2 laser
Itakura,Y. ; Yoshida,F. ; Kawasa,Y. ; Sumitani,A. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Optical Microlithography XIV.  4346  pp.1088-1094,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
7.

Conference Proceedings
Conference Proceedings
7. High-power KrF excimer laser with a solid state switch for microlithography
Mizoguchi,H. ; Ito,N. ; Nakarai,H. ; Kobayashi,Y. ; Itakura,Y. ; Komori,H. ; Wakabayashi,O. ; Aruga,T. ; Sakugawa,T. ; Koganezawa,T.
Pub. info.: Optical Microlithography IX.  Part2  pp.831-840,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726