1.

Conference Proceedings
Conference Proceedings
1. High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge
Enami,T. ; Wakabayashi,O. ; Nishisaka,T. ; Suzuki,N. ; Nire,T. ; Mizoguchi,H. ; Nakarai,H. ; Tanaka,H. ; Ariga,T. ; Shio,K. ; Okamoto,T. ; Noudomi,R. ; Tomaru,H. ; Nakao,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.1031-1040,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Billion-level durable ArF excimer laser with highly stable energy
Wakabayashi,O. ; Enami,T. ; Ohta,T. ; Tanaka,H. ; Kubo,H. ; Suzuki,T. ; Terashima,K. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1058-1068,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Performance of a highly stable 2-kHz-operation KrF Laser
Enami,T. ; Nakano,M. ; Watanabe,T. ; Ohbo,A. ; Hori,T. ; Ito,T. ; Nishisaka,T. ; Sumitani,A. ; Wakabayashi,O. ; Mizoguchi,H. ; Nakarai,H. ; Hisanaga,N. ; Matsunaga,T. ; Tanaka,H. ; Sakanishi,S. ; Okamoto,T. ; Noudomi,R. ; Suzuki,T. ; Takabayashi,Y.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1076-1084,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography
Enami,T. ; Wakabayashi,O. ; Ishii,K. ; Terashima,K. ; Itakura,Y. ; Watanabe,T. ; Ohta,T. ; Ohbu,A. ; Kubo,H. ; Tanaka,H. ; Suzuki,T. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1435-1444,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
5.

Conference Proceedings
Conference Proceedings
5. Output stabilization technology With chemical impurity control on ArF excimer laser
Sumitani,A. ; Andou,S. ; Watanabe,T. ; Konishi,M. ; Egawa,S. ; Uchino,I. ; Ohta,T. ; Terashima,K. ; Suzuki,N. ; Enami,T. ; Mizoguchi,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1424-1434,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
6.

Conference Proceedings
Conference Proceedings
6. High-repetition-rate ArF excimer laser for microlithography
Wakabayashi,O. ; Enami,T. ; Ishii,K. ; Terashima,K. ; Itakura,Y. ; Watanabe,T. ; Ohta,T. ; Ohbu,A. ; Kubo,H. ; Tanaka,H. ; Andou,S. ; Matsunga,T. ; Umeda,H. ; Suzuki,T. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan.  pp.191-194,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4088
7.

Conference Proceedings
Conference Proceedings
7. 1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage
Enami,T. ; Ohta,T. ; Tanaka,H. ; Kubo,H. ; Suzuki,T. ; Sunaka,F. ; Terashima,K. ; Sumitani,A. ; Kawasa,Y. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Laser-Induced Damage in Optical Materials: 1998.  pp.31-42,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3578