1.

Conference Proceedings
Conference Proceedings
1. Preparation of Super-Hard Nanocomposite Films by ICP Assisted Magnetron Sputtering
Miyake, S. ; Li, Z.G.
Pub. info.: New frontiers of processing and engineering in advanced materials : proceedings of the International Conference on New Frontiers of Process Scinence and Engineering in Advanced Materials : The 14th Iketani Conference, November, 24-26, 2004, held in Kyoto, Japan.  pp.297-302,  2005.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 502
2.

Conference Proceedings
Conference Proceedings
2. Advanced Ceramics Sintering Using High-Powered Millimeter-Wave Radiation
Setsuhara, Y. ; Kamai, M. ; Kinoshita, S. ; Abe, N. ; Miyake, S. ; Saji, T.
Pub. info.: Microwave processing of materials V : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.533-,  1996.  Pittsburgh,, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 430
3.

Conference Proceedings
Conference Proceedings
3. Microwave Induced Plasma (MIP) Brazing of Silicon Nitride to Stainless Steel
Samandi, M. ; Bate, M. ; Donnan, R. ; Miyake, S.
Pub. info.: Microwave processing of materials V : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.113-,  1996.  Pittsburgh,, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 430
4.

Conference Proceedings
Conference Proceedings
4. 60-nm gate length SOI CMOS technology optimised for 'System-on-a-SOI-chip' solution
Imai, K. ; Maruyama, S. ; Suzuld, T. ; Kudo, T. ; Miyake, S. ; Ikeda, M. ; Abe, T. ; Masuda, S. ; Tanabe, A. ; Lee, J-W. ; Shibahara, K. ; Yokoyania, S. ; Qoka, H.
Pub. info.: Silicon-on-insulator technology and devices XI : proceedings of the international symposium.  pp.149-158,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-5
5.

Conference Proceedings
Conference Proceedings
5. 60-nm Gate Length SOI CMOS Technology Optimized for 'System-on-a- SOI-Chip' Solution*
Imai, K. ; Maruyama, S. ; Suzuki, T. ; Kudo, T. ; Miyake, S. ; Ikeda, M. ; Abe, T. ; Masuda, S. ; Tanabe, A. ; Lee, J.-W. ; Shibahara, K. ; Yokoyama, S. ; Ooka, H.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.493-502,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6