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Conference Proceedings

1. Resist metrology for lithography simulation,part 2:development parameter measurements

Sekiguchi,A. ; Mack,C.A. ; Minami,Y. ; Matsuzawa,T.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.49-63, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725

Conference Proceedings

2. Resist metrology for lithography simulation,part I:exposure parameter measurements

Mack,C.A. ; Matsuzawa,T. ; Sekiguchi,A. ; Minami,Y.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.34-48, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725