1.

Conference Proceedings
Conference Proceedings
1. SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES
Verhaverbeke, S. ; Alay, J. ; Mertens, P. ; Meuris, M. ; Heyns, M. ; Vandervorst, W. ; Murrell, M. ; Sofield, C.
Pub. info.: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.391-398,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 259
2.

Conference Proceedings
Conference Proceedings
2. Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides
Verhaverbeke, S. ; Meuris, M. ; Mertens, P. ; Schmidt, H. ; Heyns, M.M. ; Philipossian, A. ; Graeff, D. ; Dillenbeck, K.
Pub. info.: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993.  pp.199-219,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-13
3.

Conference Proceedings
Conference Proceedings
3. CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY
Mertens, P.W. ; Meuris, M. ; Schmidt, H.F. ; Verhaverbeke, S. ; Heyns, M.M. ; Carr, P. ; Graeff, D. ; Schnegg, A. ; Kubota, M. ; Dillenbeck, K. ; de Blank, R.
Pub. info.: Proceedings of the Satellite Symposium to ESSDERC 93 Grenoble/France : crystalline defects and contamination: their impact and control in device manufacturing.  pp.87-102,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-15
4.

Conference Proceedings
Conference Proceedings
4. A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES
Meuris, M. ; Verhaverbeke, S. ; Mertens, P.W. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Heyns, M.M. ; Philipossian, A.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.15-25,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
5.

Conference Proceedings
Conference Proceedings
5. MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS
Verhaverbeke, S. ; Meuris, M. ; Schmidt, H. ; Mertens, P. ; Heyns, M.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.176-185,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
6.

Conference Proceedings
Conference Proceedings
6. NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES
Heyns, M. M. ; Verhaverbeke, S. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. ; Kubota, M. ; Philipossian, A. ; Dillenbeck, K. ; Graf, D. ; Schnegg, A. ; Blank, R. de
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.35-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
7.

Conference Proceedings
Conference Proceedings
7. HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES
Verhaverbeke, S. ; Bender, H. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. F. ; Heyns, M. M.
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.457-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315