1.

Conference Proceedings
Conference Proceedings
1. IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance
Patel, K.S. ; Lawson, M.C. ; Varanasi, P.R. ; Medeiros, D.R. ; Wallraff, G.M. ; Brock, P.J. ; DiPietro, R.A. ; Nishimura, Y. ; Chiba, T. ; Slezak, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.94-102,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. Liquid immersion lithography: evaluation of resist issues
Hinsberg, W. ; Wallraff, G.M. ; Larson, C.E. ; Davis, B.W. ; Deline, V. ; Raoux, S. ; Miller, D. ; Houle, F.A. ; Hoffnagle, J. ; Sanchez, M.I. ; Rettner, C. ; Sundberg, L.K. ; Medeiros, D.R. ; Dammel, R.R. ; Conley, W.E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.21-33,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. Effect of humidity on deprotection kinetics in chemically amplified resists
Burns, S.D. ; Medeiros, D.R. ; Johnson, H.F. ; Wallraff, G.M. ; Hinsberg, W.D. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.321-331,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. Characterization and acid diffusion measurements of new strong acid photoacid generators
Wallraff, G.M. ; Larson, C.E. ; Fender, N. ; Davis, B. ; Medeiros, D.R. ; Meute, J. ; Lamanna, W.M. ; Parent, M.J. ; Robeledo, T. ; Young, G.L.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.160-168,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
5.

Conference Proceedings
Conference Proceedings
5. Extendibility of chemically amplified resists: another brick wall? (Invited Paper)
Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Hoffnagle, J.A. ; Wallraff, G.M. ; Medeiros, D.R. ; Gallatin, G.M. ; Cobb, J.L.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.1-14,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039