1.

Conference Proceedings
Conference Proceedings
1. Current developments of a high-performance CA resist for mask-making application
Huang, W.-S. ; He, W. ; Li, W. ; Moreau, W.M. ; Lang, R. ; Medeiros, D.R. ; Petrillo, K.E. ; Mahorowala, A.P. ; Angelopoulos, M. ; Deverich, C. ; Huang, C. ; Rabidoux, P.A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.58-66,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Enhancement of KRS-XE for 50-keV advanced mask-making applications
Petrillo, K.E. ; Medeiros, D.R. ; Buccohignano, J. ; Angelopoulos, M. ; Goldfarb, D.L. ; Huang, W.-S. ; Moreau, W.M. ; Lang, R. ; Huang, C. ; Deverich, C. ; Cardinali, T.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.607-618,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Applicaton of blends and side chain Si-O copolymers as high-etch resistant sub-100-nm E-beam resists
Huang, W.-S. ; Kwong, R.W. ; Moreau, W.M. ; Lang, R. ; Medeiros, D.R. ; Petrillo, K.E. ; Mahorowala, A.P. ; Angelopoulos, M. ; Lin, Q. ; Dai, J. ; Ober, C.K.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.432-441,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
Pfeiffer, D. ; Mahorowala, A.P. ; Babich, K. ; Medeiros, D.R. ; Petrillo, K.E. ; Angelopoulos, M. ; Huang, W.-S. ; Halle, S. ; Brodsky, C. ; Allen, S.D. ; Holmes, S.J. ; Kwong, R.W. ; Lang, R. ; Brock, P.J.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.136-143,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
5.

Conference Proceedings
Conference Proceedings
5. Hardmask technology for sub-100 nm lithographic imaging
Babich, K. ; Mahorowala, A.P. ; Medeiros, D.R. ; Pfeiffer, D. ; Petrillo, K.E. ; Angelopoulos, M. ; Grill, A. ; Patel, V. ; Halle, S. ; Brunner, T.A. ; Conti, R. ; Allen, S.D. ; Wise, R.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.152-165,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039