1.

Conference Proceedings
Conference Proceedings
1. Anticipating and controlling mask costs within EDA physical design (Invited Paper)
Rieger, M.L. ; Mayhew, J.P. ; Melvin, L.S. ; Lugg, R.M. ; Beale, D.F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.617-627,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Enriching design intent for optimal OPC and RET
Rieger, M.L. ; Gravoulet, V. ; Mayhew, J.P. ; Beale, D.F. ; Lugg, R.M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.132-137,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754